Master Sato International Scholarship Foundation

at SISF in Japan

The Sato International Scholarship Foundation grants two types of scholarship for self-supporting students from ASEAN countries as well as Southwest Asian countries enrolled in a Japanese undergraduate or graduate institution: 1. Scholarship for Self-Supporting Students 2. Scholarship for Short-Term Exchange Students.

Students from the Following Countries are Eligible to Apply

Bangladesh, Bhutan, Brunei, Cambodia, India, Indonesia, Laos, Malaysia, Maldives, Myanmar, Nepal, Pakistan, Philippines, Singapore, Sri Lanka, Thailand, East Timor, Vietnam.

Scholarship for Self-Supporting Students

The applicant must be residing in Japan, enrolled in or accepted to a legitimate program. Please apply through the students’ office of your university.

Amount of Scholarship

* Undergraduate students o 120,000 yen/month * Graduate students o 180,000 yen/month o ( plus additional support to cover cost for attending conferences )

Duration of Scholarship
2 years

Number of Scholarships Granted
Around 25 students will be accepted.


The applicant must be a citizen from the aforesaid countries, who does not hold Japanese citizenship and must be enrolled in a Japanese undergraduate or graduate institution, under the jurisdiction of the Japanese Ministry of Education, Culture, Sports, Science and Technology.

The applicant must also fulfill the following requirements:

* does not receive any sort of scholarship or funding from other parties. * Holds legal residence status as a college student. * Have interest in promoting international understanding and friendship, and is able to attend SISF meetings (meetings are held 6 times/year). * Does not have a parent employed in Japan. * Does not hold a doctorate degree. * Is enrolled in a program with more than 1 year left until graduation/completion (from April 2009). This restriction does not apply to doctorate program.

Selection Process

Selected by screening committee

1. First round of selection: review of application form and documents
2. Second round of selection: interview

More information:

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Published at 24-12-2009
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